Slurries for Oxides

Saint-Gobain Glass Polishing Slurries are a series of high precision CMP slurries specifically formulated for different types of oxide applications such as bulk oxide CMP, oxide ILD or glass substrate polishing. They utilize Saint-Gobain’s proprietary zirconia particles and ceria particles that greatly enhance removal rates compared to other competitive abrasives. It is also formulated with proprietary chemistries which further enhance planarization efficiency. Saint-Gobain glass slurries also contain unique additives that provide excellent surface defectivity and cleanability. They have excellent slurry shelflife stability. These slurries have high colloidal and biological stability for enhanced ease of use.
Slurries for oxide


Features and Benefits:

  • Internally engineered abrasive particles leading to unmatchable removal efficiency
  • Tight control of particle size distribution
  • Formulation chemistry designed to maxime CoO and improve cleanability
  • Knowledgeable application engineers available to answer questions
  • Our solutions can be customized according to specific application requests with adapted particle design and chemistry 
  Cerpol 27C ZSL 200
Suitable Application Oxide Polishing Oxide Polishing
Abrasive type Engineered Ceria Engineered Zirconia
Particle size D50 600nm 180nm
Dilution Ratio 5X  10x
pH 10 8.5
Solids Contents 15% 10%

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