Slurries for Oxides
Saint-Gobain Glass Polishing Slurries are a series of high precision CMP slurries specifically formulated for different types of oxide applications such as bulk oxide CMP, oxide ILD or glass substrate polishing. They utilize Saint-Gobain’s proprietary zirconia particles and ceria particles that greatly enhance removal rates compared to other competitive abrasives. It is also formulated with proprietary chemistries which further enhance planarization efficiency. Saint-Gobain glass slurries also contain unique additives that provide excellent surface defectivity and cleanability. They have excellent slurry shelflife stability. These slurries have high colloidal and biological stability for enhanced ease of use.
Features and Benefits:
- Internally engineered abrasive particles leading to unmatchable removal efficiency
- Tight control of particle size distribution
- Formulation chemistry designed to maxime CoO and improve cleanability
- Knowledgeable application engineers available to answer questions
- Our solutions can be customized according to specific application requests with adapted particle design and chemistry
| Cerpol 27C | ZSL 200 | |
|---|---|---|
| Suitable Application | Oxide Polishing | Oxide Polishing |
| Abrasive type | Engineered Ceria | Engineered Zirconia |
| Particle size D50 | 600nm | 180nm |
| Dilution Ratio | 5X | 10x |
| pH | 10 | 8.5 |
| Solids Contents | 15% | 10% |
Related Applications
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