Zirconia particle suspensions are engineered for advance polishing applications that demand high precision stability, and minimal defectivity to achieve superior surface quality. These suspensions provide a narrow particle size distribution and reliable colloidal performance.

A balance between hardness, removal rate, and material selectivity, zirconia suspensions are highly effective for oxide and nitride CMP processes, TSV applications, and glass finishing. Designed for uniform planarization and high removal efficiency, zirconia particle suspensions maintain both chemical and thermal stability under demanding process conditions. In addition, our zirconia particle suspensions integrate easily into a wide range of formulations, supporting consistent performance across diverse substrates, applications, and polishing environments.